Projeto conceitual de um reator de deposição física de vapor (PVD) tipo Magnetron Sputtering

Abstract

The objective of this work is to develop the conceptual design of a Physical Vapor Deposition (PVD) reactor using the magnetron sputtering technique, in order to meet the regional demand for advanced equipment capable of depositing thin films and functional coatings. The study begins by recognizing that the state of Amazonas faces significant challenges related to scientific infrastructure, which directly hinders progress in strategic fields such as nanotechnology, materials engineering, and tribology. Within this context, the research proposes a solid, accessible, and efficient conceptual model that can foster academic autonomy and strengthen the region’s research capabilities. To support the reactor’s development, an extensive theoretical review was conducted on PVD methods, industrial applications, and critical operational parameters such as pressure, gas composition, chamber geometry, and plasma conditioning. Important technological challenges were also examined, including deposition rate control, energy efficiency, plasma stability, and scalability constraints. The study evaluates existing academic and industrial reactor designs, enabling comparison of configurations, identification of best practices, and acceleration of the conceptual decision making process. The methodology employed is grounded in the systematic engineering design approach proposed by Pahl and Beitz, encompassing task clarification, requirements gathering, generation and assessment of design alternatives, and selection of the optimal configuration. Various design options were developed—covering different magnetron types, vacuum systems, gas-flow control mechanisms, power supplies, and cooling strategies—and subsequently evaluated using a weighted decision matrix. The selected configuration, consisting of a compact cylindrical chamber, planar magnetron, turbomolecular pump, and basic gas-control system, offered the best balance among efficiency, cost, durability, and ease of maintenance. The results demonstrate that the conceptual model satisfies typical operational requirements for producing metallic and compound thin films, ensuring controllable deposition rates, high uniformity, and simplified maintenance. Beyond presenting a technically feasible solution, the study highlights the potential impact of implementing such a reactor on the scientific and technological development of the state of Amazonas, contributing to reduced external dependence, the training of specialized personnel, and the stimulation of future research and innovation in surface engineering.